Blank Cover Image

THE INFLUENCE OF TEMPERATURE GRADIENTS ON PARTIAL PRESSURES IN A CVD REACTOR

Author(s):
Oosterlaken, T. G. M.
Leusink, G. J.
Janssen, G. C. A. M.
Radelaar, S.
Kuijlaars, K. J.
Kleijn, C. R.
Akker, H. E. A. Van Den
2 more
Publication title:
Gas-phase and surface chemistry in electronic materials processing : symposium held November 29-December 2, 1993, Boston, Massachusetts, U.S.A.
Title of ser.:
Materials Research Society symposium proceedings
Ser. no.:
334
Pub. Year:
1994
Page(from):
483
Pub. info.:
Pittsburgh, PA: MRS - Materials Research Society
ISSN:
02729172
ISBN:
9781558992337 [1558992332]
Language:
English
Call no.:
M23500/334
Type:
Conference Proceedings

Similar Items:

1 Conference Proceedings GROWTH STRESS IN CVD-WGex FILMS DEPOSITED BY REDUCTION OF WF6 BY GeH4

Leusink, G. J., Oosterlaken, T. G. M., Janssen, G. C. A. M., Radelaar, S.

MRS - Materials Research Society
7 Conference Proceedings Simulation of Silicon Dioxide Deposition in a Vertical 300 mm LPCVD Furnace

G. J. Schoof, C.R.Kleijn, H. E. A. Van den Akker, T.G.M.Oosterlaken, H. J. C. M. Terhorst, F.Huussen

American Society of Mechanical Engineers
2 Conference Proceedings EVOLUTION OF INTRINSIC STRESS DURING NUCLEATION AND GROWTH OF POLYCRYSTALLINE TUNGSTEN FILMS BY CHEMICAL VAPOR DEPOSITION

Leusink, G. J., Oosterlaken, T. G. M., Janssen, G. C. A.M., Radelaar, S.

Materials Research Society
8 Conference Proceedings IN SITU STRESS MEASUREMENTS DURING THE REACTION OF WF6 WITH Si(100)

Leusink, G.J., Heerkens, C.Th.H., Janssen, G.C.A.M., Radelaar, S.

Materials Research Society
3 Conference Proceedings The Kinetics of Tungsten Deposition from a H2/WF6- Mixture Studied by In-Situ Laser Raman Scattering

Oosterlaken, T.G.M., Leusink, G.J., Janssen, G.C.A.M., Radelaar, S.

Electrochemical Society
9 Conference Proceedings On the Occurrence of Non-Symmetnc Flows in Axisymmetric CVD Reactors

van Santen, H., Kleijn, C.R., van den Akker, H.E.A.

Electrochemical Society
4 Conference Proceedings Turbulence and its Influence on Mass Transfer in a Rotating Disk CVD Reactor

Van Santen, H., Kleijn, C.R., Van Den Akker, H.E.A.

Electrochemical Society
10 Conference Proceedings SELECTIVE CHEMICAL VAPOUR DEPOSITION OF TUNGSTEN USING SiH4WF6 CHEMISTRY

van der Jeugd, C.A., Verbruggen, A.H., Leusink, G.J., Janssen, G.C.A.M., Radelaar, S.

Materials Research Society
5 Conference Proceedings Modeling of Transport Phenomena and Detailed Chemistry in Chemical Vapor Deposition Equipment

Kuijlaars, K.J., Kleijn, C.R., van den Akker, H.E.A.

Electrochemical Society
11 Conference Proceedings A Two-Dimensional Simulation Model for Oxy-Acetylene Flame CVD of Diamond Films

Okkerse, M., Kleijn, C., van den Akker, H., de Croon, M.H.J.M., Mann, G.B.

Electrochemical Society
6 Conference Proceedings DEPOSIT OF TUNGSTEN ON SILICON DIOXIDE BY GeH4 REDUCTION OF WF6

Oosterlaken, T. G. M., Luisink, G. J., van der Leugd, C. A., Janssen, G. C. A. M, Radelaar, S.

Materials Research Society
12 Conference Proceedings In-situ wafer curvature measurements during rapid thermal annealing of Si(100)wafers

Jongste,J.F., Oosterlaken,T.G.M., Bart,G.C.J., Janssen,G.C.A.M., Radelaar,S.

SPIE-The International Society for Optical Engineering
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12