New approach to phase metrology for manufacturing 248-nm lithography-based embedded attenuated phase-shifting mask
- Author(s):
- Dao,G.T. ( Intel Corp. )
- Liu,G.
- Snyder,A.
- Farnsworth,J.N.
- Publication title:
- Photomask and X-Ray Mask Technology III
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 2793
- Pub. Year:
- 1996
- Page(from):
- 359
- Page(to):
- 370
- Pub. info.:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819421791 [0819421790]
- Language:
- English
- Call no.:
- P63600/2793
- Type:
- Conference Proceedings
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