Defect printability analysis in electron-beam cell projection lithography
- Author(s):
- Itoh,K. ( NEC Corp. )
- Yamashita,H.
- Ema,T.
- Nozue,H.
- Publication title:
- Photomask and X-Ray Mask Technology III
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 2793
- Pub. Year:
- 1996
- Page(from):
- 230
- Page(to):
- 240
- Pub. info.:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819421791 [0819421790]
- Language:
- English
- Call no.:
- P63600/2793
- Type:
- Conference Proceedings
Similar Items:
SPIE-The International Society for Optical Engineering |
7
Conference Proceedings
One-dimensional calculation method for proximity effect correction in cell projection electron-beam direct writing
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
8
Conference Proceedings
Stitching accuracy measurement system for EB direct writing and electron-beam projction lithography (EPL)
SPIE-The International Society for Optical Engineering |
3
Conference Proceedings
Defect printability analysis on electron projection lithography with diamond stencil reticle
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
4
Conference Proceedings
Development of data conversion system for electron-beam projection lithography (EPL) mask
SPIE-The International Society for Optical Engineering |
10
Conference Proceedings
Performance of beta tool for low-energy electron-beam proximity-projection lithography (LEEPL)
SPIE-The International Society for Optical Engineering |
5
Conference Proceedings
0.15-ヲフm pattern formation using cell projection electron-beam direct writing with variable shot size
SPIE-The International Society for Optical Engineering |
11
Conference Proceedings
Highly accurate stitching method between cell projection and variably shaped e-beam shots
SPIE-The International Society for Optical Engineering |
6
Conference Proceedings
Optimization of PHS-based chemically amplified negative resist for 100-kV electron-beam projection lithography(EPL)
SPIE - The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |