Investigation on application of chromium-based materials to attenuated phase-shift masks for DUV exposure
- Author(s):
Hong,S. ( Korea Advanced Institute of Science and Technology ) Kim,E. Jiang,Z.-T. Bae,B.-S. No,K. Shin,W. Lim,S.-C. Woo,S.-G. Koh,Y.-B. - Publication title:
- Photomask and X-Ray Mask Technology III
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 2793
- Pub. Year:
- 1996
- Page(from):
- 134
- Page(to):
- 137
- Pub. info.:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819421791 [0819421790]
- Language:
- English
- Call no.:
- P63600/2793
- Type:
- Conference Proceedings
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