Manufacturing feasibility of OPC masks for 0.25-ヲフm rule devices
- Author(s):
Kawahira,H. ( Sony Corp. ) Katsumata,M. Tsudaka,K. Ogura,A. Tomita,M. Nozawa,S. - Publication title:
- Photomask and X-Ray Mask Technology III
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 2793
- Pub. Year:
- 1996
- Page(from):
- 22
- Page(to):
- 33
- Pub. info.:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819421791 [0819421790]
- Language:
- English
- Call no.:
- P63600/2793
- Type:
- Conference Proceedings
Similar Items:
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
8
Conference Proceedings
Characterization of gate electrode etch process for 0.25 ヲフm extended to 0.18 ヲフm
SPIE - The International Society for Optical Engineering |
3
Conference Proceedings
Fast EB-PEC system for 0.25-ヲフm device reticle fabrication using a variable shaped beam machine
SPIE-The International Society for Optical Engineering |
9
Conference Proceedings
Minimization of DUV multi-interference effect in 0.25-ヲフm device fabrication
SPIE-The International Society for Optical Engineering |
4
Conference Proceedings
Optical proximity correction considering mask manufacturability and its application to 0.25-ヲフm DRAM for enhanced device performance
SPIE - The International Society for Optical Engineering |
MRS - Materials Research Society |
5
Conference Proceedings
Fast-resist image estimation methodology using light-intensity distribution
Society of Photo-optical Instrumentation Engineers |
11
Conference Proceedings
0.25-ヲフm logic manufacturability using practical 2D optical proximity correction
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
12
Conference Proceedings
Mask CD quality assurance specifications for 0.25-ヲフm devices with a practical lithography window
SPIE-The International Society for Optical Engineering |