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Bilevel resist process for 1-Gb DRAM reticles

Author(s):
Publication title:
Photomask and X-Ray Mask Technology III
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
2793
Pub. Year:
1996
Page(from):
12
Page(to):
21
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819421791 [0819421790]
Language:
English
Call no.:
P63600/2793
Type:
Conference Proceedings

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