One-level gray-tone lithography:mask data preparation and pattern transfer
- Author(s):
- Reimer,K. ( Fraunhofer-Institut fur Siliziumtechnologie )
- Quenzer,H.
- Demmeler,R.
- Wagner,B.
- Publication title:
- Micro-optical technologies for measurement, sensors, and microsystems : 12-13 June 1996, Besançon, France
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 2783
- Pub. Year:
- 1996
- Page(from):
- 71
- Page(to):
- 79
- Pub. info.:
- Bellingham, Wash., USA: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819421692 [0819421693]
- Language:
- English
- Call no.:
- P63600/2783
- Type:
- Conference Proceedings
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