Electrical characterization of FSG low K dielectric deposition in HDP and PECVD tools

Electrical characterization of FSG low K dielectric deposition in HDP and PECVD tools

Author(s):

Bersuker,G. ( SEMATECH )
Shapiro,M.J. ( SEMATECH )
Werking,J. ( SEMATECH )
Kim,S.U. ( SEMATECH )

Publication title:

Process, Equipment, and Materials Control in Integrated Circuit Manufacturing III

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

3213

Pub. Year:

1997

Page(from):

204

Page(to):

209

Pub. info.:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819426451 [0819426458]

Language:

English

Call no.:

P63600/3213

Type:

Conference Proceedings

Details

TDL ID:	ZA00017866
Series ID:	PA00000029
Conf. info. (Name):	Microelectronic Manufacturing : Process, Equipment, and Materials Control in Integrated Circuit Manufacturing
Conf. info. (Number):	1997 : 3rd
Conf. info. (Venue):	Austin, TX, USA
Conf. info. (Date):	1997.10.01-1997.10.02

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