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New method for end-point detection in reactive ion etching of polysilicon

Author(s):
  • Aslam,S. ( NASA Goddard Space Flight Ctr. )
  • Das,N.C. ( NASA Goddard Space Flight Ctr. )
  • Hughes STX ( NASA Goddard Space Flight Ctr. )
  • Shu,P.K. ( NASA Goddard Space Flight Ctr. )
Publication title:
Process, Equipment, and Materials Control in Integrated Circuit Manufacturing III
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
3213
Pub. Year:
1997
Page(from):
73
Page(to):
78
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819426451 [0819426458]
Language:
English
Call no.:
P63600/3213
Type:
Conference Proceedings

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