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Stability of optical interference coatings exposed to low-fluence 193-nm ArF radiation

Author(s):
Heber,J. ( Fraunhofer-Institut fur Angewandte Optik und Feinmechanik (FRG) )
Thielsch,R. ( Fraunhofer-Institut fur Angewandte Optik und Feinmechanik (FRG) )
Blaschke,H. ( Fraunhofer-Institut fur Angewandte Optik und Feinmechanik (FRG) )
Kaiser,N. ( Fraunhofer-Institut fur Angewandte Optik und Feinmechanik (FRG) )
Mann,K.R. ( Laser Lab. Gottingen e.V. (FRG) )
Eva,E. ( Laser Lab. Gottingen e.V. (FRG) )
Leinhos,U. ( Lambda Physik GmbH (FRG) )
Gortler,A. ( Lambda Physik GmbH (FRG) )
3 more
Publication title:
Optical microlithography XI : 25-27 February 1998, Santa Clara, California
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
3334
Pub. Year:
1998
Page(from):
1041
Page(to):
1047
Pub. info.:
Bellingham, Wash., USA: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819427793 [0819427799]
Language:
English
Call no.:
P63600/3334
Type:
Conference Proceedings

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