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Laser alignment strictness for optical diffraction effect in lithography processes

Author(s):
  • Lin,H.-P. ( Taiwan Semiconductor Manufacturing Co. )
  • Lee,C.-H. ( Taiwan Semiconductor Manufacturing Co. )
  • Lo,Y.-C. ( Taiwan Semiconductor Manufacturing Co. )
  • Lu,K.L. ( Taiwan Semiconductor Manufacturing Co. )
Publication title:
Optical microlithography XI : 25-27 February 1998, Santa Clara, California
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
3334
Pub. Year:
1998
Page(from):
986
Page(to):
996
Pub. info.:
Bellingham, Wash., USA: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819427793 [0819427799]
Language:
English
Call no.:
P63600/3334
Type:
Conference Proceedings

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