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New method for optical proximity correction with gray-level serifs

Author(s):
  • Du,J. ( Sichuan Univ.(China) )
  • Huang,Q. ( Sichuan Univ.(China) )
  • Guo,Y. ( Sichuan Univ.(China) )
  • Cui,Z. ( Rutherford Appleton Lab. (UK) )
Publication title:
Optical microlithography XI : 25-27 February 1998, Santa Clara, California
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
3334
Pub. Year:
1998
Page(from):
932
Page(to):
938
Pub. info.:
Bellingham, Wash., USA: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819427793 [0819427799]
Language:
English
Call no.:
P63600/3334
Type:
Conference Proceedings

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