Benchmarking of software tools for optical proximity correction

Benchmarking of software tools for optical proximity correction

Author(s):

Jungmann,A. ( Siemens AG (FRG) )
Thiele,J. ( Siemens AG (FRG) )
Friedrich,C. ( Siemens AG (FRG) )
Pforr,R. ( SIMEC GmbH (FRG) )
Maurer,W. ( Siemens AG (FRG) )

Publication title:

Optical microlithography XI : 25-27 February 1998, Santa Clara, California

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

3334

Pub. Year:

1998

Page(from):

921

Page(to):

931

Pub. info.:

Bellingham, Wash., USA: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819427793 [0819427799]

Language:

English

Call no.:

P63600/3334

Type:

Conference Proceedings

Details

TDL ID:	ZA00017855
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Optical Microlithography
Conf. info. (Number):	1998 : 11th
Conf. info. (Venue):	Santa Clara, CA, USA
Conf. info. (Date):	1998.02.25-1998.02.27

Similar Items:

1 Conference Proceedings Process proximity correction using an automated software tool Maurer,W., Dolainsky,C., Thiele,J., Friedrich,C., Karakatsanis,P. SPIE-The International Society for Optical Engineering	7 Conference Proceedings High-accuracy simulation-based optical proximity correction Keck, M.C., Henkel, T., Ziebold, R., Crell, C., Thiele, J. SPIE - The International Society of Optical Engineering
2 Conference Proceedings Integration of alternating phase-shift mask technology into optical proximity correction Thiele,J., Friedrich,C., Dolainsky,C., Karakatsanis,P., Maurer,W. SPIE - The International Society for Optical Engineering	8 Conference Proceedings Evaluation of resist models for fast optical proximity correction Dolainsky,C., Maurer,W., Waas,T. SPIE-The International Society for Optical Engineering
3 Conference Proceedings Proximity effects of alternating phase-shift masks Maurer,W., Friedrich,C., Mader,L., Thiele,J. SPIE - The International Society for Optical Engineering	9 Conference Proceedings Application of a new approach to optical proximity correction Rosenbusch,A., Hourd,A.C., Juffermans,C.A., Kirsch,H., Lalanne,F.P., Maurer,W., Romeo,C., Ronse,K., Schiavone,P., … SPIE - The International Society for Optical Engineering
4 Conference Proceedings New approach to optical proximity correction Rosenbusch,A., Juffermans,A.H., Kirsch,H., Lalanne,F.P., Maurer,W., Romeo,C., Ronse,K., Schiavone,P., Simecek,M., … SPIE - The International Society for Optical Engineering	10 Conference Proceedings Evaluating the potential of alternating phase-shift masks using lithography simulation Friedrich,C., Ergenzinger,K., Gans,F., Crassmann,A., Griesinger,U.A., Knobloch,J., Mader,L., Maurer,W., Pforr,R. SPIE - The International Society for Optical Engineering
5 Conference Proceedings Comparison of line shortening assessed by aerial image and wafer measurements Ziegler,W., Pforr,R., Thiele,J., Maurer,W. SPIE-The International Society for Optical Engineering	11 Conference Proceedings Characterization of optical proximity correction features Allgair,J.A., Ivy,M., Lucas,K., Sturtevant,J.L., Elliott,R.C., Mack,C.A., MacNaughton,C.W., Miller,J.D., Pochkowski,M., … SPIE-The International Society for Optical Engineering
6 Conference Proceedings Application of a simple resist model to fast optical proximity correction Dolainsky,C., Maurer,W. SPIE-The International Society for Optical Engineering	12 Conference Proceedings Optimizing edge topography of alternating phase-shift masks using rigorous mask modeling Friedrich,C., Mader,L., Erdmann,A., List,S., Gordon,R.L., Kalus,C.K., Griesinger,U.A., Pforr,R., Mathuni,J., Ruhl,G.G., … SPIE - The International Society for Optical Engineering

1

2

3

4

5

6

7

8

9

10

11

12