Performance of an i-line step-and-scan system for sub-0.25-ヲフm mix-and-match applications
- Author(s):
van,Oorschot,P. ( ASM Lithography BV (Netherlands) ) Koek,B. ( ASM Lithography BV (Netherlands) ) van,der,Spek,J. ( ASM Lithography BV (Netherlands) ) Stuiver,E. ( ASM Lithography BV (Netherlands) ) Franken,H. ( ASM Lithography BV (Netherlands) ) Botter,H. ( ASM Lithography BV (Netherlands) ) Garreis,R. ( Carl Zeiss (FRG) ) - Publication title:
- Optical microlithography XI : 25-27 February 1998, Santa Clara, California
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 3334
- Pub. Year:
- 1998
- Page(from):
- 423
- Page(to):
- 436
- Pub. info.:
- Bellingham, Wash., USA: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819427793 [0819427799]
- Language:
- English
- Call no.:
- P63600/3334
- Type:
- Conference Proceedings
Similar Items:
1
Conference Proceedings
CD control comparison of step-and-repeat versus step-and-scan DUV lithography for sub-0.25-ヲフm gate printing
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
2
Conference Proceedings
NA/o optimization strategies for an advanced DUV stepper applied to 0.25-ヲフm and sub-0.25-ヲフm critical levels
SPIE-The International Society for Optical Engineering |
8
Conference Proceedings
Meeting advanced pattern inspection system requirements for 0.25-ヲフm technology and beyond
SPIE-The International Society for Optical Engineering |
3
Conference Proceedings
Integration of Multi-Level Copper Metallization into a High-Performance Sub-0.25 ヲフm Technology
MRS - Materials Research Society |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
10
Conference Proceedings
0.25-ヲフm logic manufacturability using practical 2D optical proximity correction
SPIE-The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |
11
Conference Proceedings
ArF step-and-scan exposure system for 0.15-ヲフm and 0.13-ヲフm technology nodes
SPIE - The International Society for Optical Engineering |
6
Conference Proceedings
Practical implementation of alternating PSM to memory device of sub-0.25-ヲフm technology
SPIE-The International Society for Optical Engineering |
12
Conference Proceedings
Characterization of gate electrode etch process for 0.25 ヲフm extended to 0.18 ヲフm
SPIE - The International Society for Optical Engineering |