Performance of an i-line step-and-scan system for sub-0.25-ｦﾌm mix-and-match applications

Performance of an i-line step-and-scan system for sub-0.25-ｦﾌm mix-and-match applications

Author(s):

van,Oorschot,P. ( ASM Lithography BV (Netherlands) )

Koek,B. ( ASM Lithography BV (Netherlands) )

van,der,Spek,J. ( ASM Lithography BV (Netherlands) )

Stuiver,E. ( ASM Lithography BV (Netherlands) )

Franken,H. ( ASM Lithography BV (Netherlands) )

Botter,H. ( ASM Lithography BV (Netherlands) )

Garreis,R. ( Carl Zeiss (FRG) )

2 more

Publication title:

Optical microlithography XI : 25-27 February 1998, Santa Clara, California

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

3334

Pub. Year:

1998

Page(from):

423

Page(to):

436

Pub. info.:

Bellingham, Wash., USA: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819427793 [0819427799]

Language:

English

Call no.:

P63600/3334

Type:

Conference Proceedings

Details

TDL ID:	ZA00017855
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Optical Microlithography
Conf. info. (Number):	1998 : 11th
Conf. info. (Venue):	Santa Clara, CA, USA
Conf. info. (Date):	1998.02.25-1998.02.27

Similar Items:

1 Conference Proceedings CD control comparison of step-and-repeat versus step-and-scan DUV lithography for sub-0.25-ｦﾌm gate printing Ronse,K., Maenhoudt,M., Marschner,T., Van,den,hove,L., Streefkerk,B., Finders,J., van,Schoot,J., Luehrmann,P.F., … SPIE-The International Society for Optical Engineering	7 Conference Proceedings Self-aligned silicide process technology for sub-0.25-ｦﾌm geometries White,T.R., Kolar,D., Jahanbani,M., Frisa,L.E., Nagabushnam,R., Chuang,H., Tsui,P., Cope,J., Pulvirent,L., Bolton,S. SPIE-The International Society for Optical Engineering
2 Conference Proceedings NA/o optimization strategies for an advanced DUV stepper applied to 0.25-ｦﾌm and sub-0.25-ｦﾌm critical levels Beeck,M.Op de, Ronse,K., Ghandehari,K., Jaenen,P., Botermans,H., Finders,J., Lilygren,J.A., Baker,D.C., Vandenberghe,G., … SPIE-The International Society for Optical Engineering	8 Conference Proceedings Meeting advanced pattern inspection system requirements for 0.25-ｦﾌm technology and beyond Trafas,B.M., Bennett,M.H., Godwin,M. SPIE-The International Society for Optical Engineering
3 Conference Proceedings Integration of Multi-Level Copper Metallization into a High-Performance Sub-0.25 ｦﾌm Technology Venkatraman, R., Jain, A., Farkas, J., Mendonca, J., Hamilton, G., Capasso, C., Denning, D., Simpson, C., Rogers, B., … MRS - Materials Research Society	9 Conference Proceedings Merged 2.5-V and 3.3-V 0.25-ｦﾌm CMOS technology Kizilyalli,I.C., Huang,R.Y., Hwang,D., Kane,B.C., Ashton,R., Kuehne,S., Deng,X., Twiford,M.S., Martin,E.P., … SPIE-The International Society for Optical Engineering
4 Conference Proceedings Micrascan III:0.25-ｦﾌm resolution step-and-scan system Williamson,D.M., McClay,J.A., Andresen,K.W., Gallatin,G.M., Himel,M.D., Ivaldi,J., Mason,C., McCullough,A.W., Otis,C., … SPIE-The International Society for Optical Engineering	10 Conference Proceedings 0.25-ｦﾌm logic manufacturability using practical 2D optical proximity correction Kling,M.E., Lucas,K.D., Reich,A., Roman,B.J., Chuang,H., Gilbert,P.V., Grobman,W.D., Travis,E.O., Tsui,P., Vuong,T., … SPIE-The International Society for Optical Engineering
5 Conference Proceedings Flare impact on the intrafield CD control for sub-0.25-ｦﾌm patterning Luce,E., Minghetti,B., Schiavone,P., Toublan,O., Weill,A.P. SPIE - The International Society for Optical Engineering	11 Conference Proceedings ArF step-and-scan exposure system for 0.15-ｦﾌm and 0.13-ｦﾌm technology nodes Mulkens,J., Stoeldraijer,J.M., Davies,G., Dierichs,M., Heskamp,B., Moers,M.H., George,R.A., Roempp,O., Glatzel,H., … SPIE - The International Society for Optical Engineering
6 Conference Proceedings Practical implementation of alternating PSM to memory device of sub-0.25-ｦﾌm technology Ahn,C.-N., Kim,H.-E., Kim,H.-B., Baik,K.-H. SPIE-The International Society for Optical Engineering	12 Conference Proceedings Characterization of gate electrode etch process for 0.25 ｦﾌm extended to 0.18 ｦﾌm Gerung,H., Chhagan,V.K., Yelehanka,P.R., Zhou,M.S., Hui,J.K.L. SPIE - The International Society for Optical Engineering

1

2

3

4

5

6

7

8

9

10

11

12