Aberration evaluation and tolerancing of 193-nm lithographic objective lenses

Aberration evaluation and tolerancing of 193-nm lithographic objective lenses

Author(s):

Smith,B.W. ( Rochester Institute of Technology )
Webb,J.E. ( Tropel Corp. )
Petersen,J.S. ( SEMATECH )
Meute,J. ( SEMATECH )

Publication title:

Optical microlithography XI : 25-27 February 1998, Santa Clara, California

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

3334

Pub. Year:

1998

Page(from):

269

Page(to):

280

Pub. info.:

Bellingham, Wash., USA: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819427793 [0819427799]

Language:

English

Call no.:

P63600/3334

Type:

Conference Proceedings

Details

TDL ID:	ZA00017855
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Optical Microlithography
Conf. info. (Number):	1998 : 11th
Conf. info. (Venue):	Santa Clara, CA, USA
Conf. info. (Date):	1998.02.25-1998.02.27

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