Process proximity correction using an automated software tool

Process proximity correction using an automated software tool

Author(s):

Maurer,W. ( Siemens AG (FRG) )
Dolainsky,C. ( aiss GmbH (FRG) )
Thiele,J. ( Siemens AG (FRG) )
Friedrich,C. ( Siemens AG (FRG) )
Karakatsanis,P. ( aiss GmbH (FRG) )

Publication title:

Optical microlithography XI : 25-27 February 1998, Santa Clara, California

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

3334

Pub. Year:

1998

Page(from):

245

Page(to):

253

Pub. info.:

Bellingham, Wash., USA: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819427793 [0819427799]

Language:

English

Call no.:

P63600/3334

Type:

Conference Proceedings

Details

TDL ID:	ZA00017855
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Optical Microlithography
Conf. info. (Number):	1998 : 11th
Conf. info. (Venue):	Santa Clara, CA, USA
Conf. info. (Date):	1998.02.25-1998.02.27

Similar Items:

1 Conference Proceedings Integration of alternating phase-shift mask technology into optical proximity correction Thiele,J., Friedrich,C., Dolainsky,C., Karakatsanis,P., Maurer,W. SPIE - The International Society for Optical Engineering	7 Conference Proceedings New approach to optical proximity correction Rosenbusch,A., Juffermans,A.H., Kirsch,H., Lalanne,F.P., Maurer,W., Romeo,C., Ronse,K., Schiavone,P., Simecek,M., … SPIE - The International Society for Optical Engineering
2 Conference Proceedings Benchmarking of software tools for optical proximity correction Jungmann,A., Thiele,J., Friedrich,C., Pforr,R., Maurer,W. SPIE-The International Society for Optical Engineering	8 Conference Proceedings Application of a new approach to optical proximity correction Rosenbusch,A., Hourd,A.C., Juffermans,C.A., Kirsch,H., Lalanne,F.P., Maurer,W., Romeo,C., Ronse,K., Schiavone,P., … SPIE - The International Society for Optical Engineering
3 Conference Proceedings Application of a simple resist model to fast optical proximity correction Dolainsky,C., Maurer,W. SPIE-The International Society for Optical Engineering	9 Conference Proceedings Adjustment of optical proximity correction (OPC) software for mask process correction (MPC): Module 2. Lithography simulation based on optical mask writing tool … Barberet, A., Buck, P.D., Fanget, G.L., Toublan, O., Richoilley, J.-C., Tissier, M. SPIE-The International Society for Optical Engineering
4 Conference Proceedings Evaluation of resist models for fast optical proximity correction Dolainsky,C., Maurer,W., Waas,T. SPIE-The International Society for Optical Engineering	10 Conference Proceedings Adjustment of optical proximity correction (OPC) software for mask process correction (MPC). Module 1: Optical mask writing tool simulation Barberet,A., Fanget,G.L., Buck,P.D., Toublan,O., Richoilley,J.-C., Tissier,M. SPIE-The International Society for Optical Engineering
5 Conference Proceedings Simulation-based method for sidelobe supression Dolainsky,C., Karakatsanis,P., Gans,F., Pforr,R., Thiele,J. SPIE - The International Society for Optical Engineering	11 Conference Proceedings Simulation-based proximity correction in high-volume DRAM production Fischer,W., Anke,I., Schweeger,G., Thiele,J. SPIE - The International Society for Optical Engineering
6 Conference Proceedings Proximity effects of alternating phase-shift masks Maurer,W., Friedrich,C., Mader,L., Thiele,J. SPIE - The International Society for Optical Engineering	12 Conference Proceedings Proximity effect correction for the chemical shrink process of different type contact holes W. H. Hsieh, H. J. Liu, W. B. Wu, C. L. Shin, J. P. Lin SPIE - The International Society of Optical Engineering

1

2

3

4

5

6

7

8

9

10

11

12