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LAVA: lithography analysis using virtual access

Author(s):
Hsu,C. ( Univ.of California/Berkeley )
Yang,R. ( Univ.of California/Berkeley )
Cheng,J. ( Univ.of California/Berkeley )
Chien,P. ( Univ.of California/Berkeley )
Wen,V. ( Univ.of California/Berkeley )
Neureuther,A.R. ( Univ.of California/Berkeley )
1 more
Publication title:
Optical microlithography XI : 25-27 February 1998, Santa Clara, California
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
3334
Pub. Year:
1998
Page(from):
197
Page(to):
201
Pub. info.:
Bellingham, Wash., USA: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819427793 [0819427799]
Language:
English
Call no.:
P63600/3334
Type:
Conference Proceedings

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