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Impact of coma on CD control for multiphase PSM designs

Author(s):
Schmidt,R.T. ( Advanced Micro Devices,Inc. )
Spence,C.A. ( Advanced Micro Devices,Inc. )
Capodieci,L. ( Advanced Micro Devices,Inc. )
Krivokapic,Z. ( Advanced Micro Devices,Inc. )
Geh,B. ( Carl Zeiss (FRG) )
Flagello,D.G. ( ASM Lithography BV (Netherlands) )
1 more
Publication title:
Optical microlithography XI : 25-27 February 1998, Santa Clara, California
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
3334
Pub. Year:
1998
Page(from):
15
Page(to):
24
Pub. info.:
Bellingham, Wash., USA: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819427793 [0819427799]
Language:
English
Call no.:
P63600/3334
Type:
Conference Proceedings

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