Preliminary evaluation results of 895i and iPl7OO replacement resist for advanced laser reticle fabrication

Author(s):

• Asakawa,K. ( HOYA Corp. (Japan) )
• Kobayashi,H. ( HOYA Corp. (Japan) )
• Higuchi,T. ( HOYA Corp. (Japan) )
• Yokoya,Y. ( HOYA Corp. (Japan) )

Publication title:

Photomask and X-Ray Mask Technology V

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

3412

Pub. Year:

1998

Page(from):

297

Page(to):

306

Pub. info.:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819428646 [0819428647]

Language:

English

Call no.:

P63600/3412

Type:

Conference Proceedings