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Performance of a chemically amplified positive resist for next-generation photomask fabrication

Author(s):
  • Kurihara,M. ( Dai Nippon Printing Co.,Ltd. (Japan) )
  • Segawa,T. ( Dai Nippon Printing Co.,Ltd. (Japan) )
  • Okuno,D. ( Dai Nippon Printing Co.,Ltd. (Japan) )
  • Hayashi,N. ( Dai Nippon Printing Co.,Ltd. (Japan) )
  • Sano,H. ( Dai Nippon Printing Co.,Ltd. (Japan) )
Publication title:
Photomask and X-Ray Mask Technology V
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
3412
Pub. Year:
1998
Page(from):
279
Page(to):
291
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819428646 [0819428647]
Language:
English
Call no.:
P63600/3412
Type:
Conference Proceedings

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