Blank Cover Image

Process optimization for mask fabrication

Author(s):
Sakurai,H. ( Toshiba Microelectronics Engineering Lab. (Japan) )
Itoh,M. ( Toshiba Microelectronics Engineering Lab. (Japan) )
Kumagae,A. ( Toshiba Microelectronics Engineering Lab. (Japan) )
Anze,H. ( Toshiba Advanced Semiconductor Device Lab. (Japan) )
Abe,T. ( Toshiba Advanced Semiconductor Device Lab. (Japan) )
Higashikawa,I. ( Toshiba Microelectronics Engineering Lab. (Japan) )
1 more
Publication title:
Photomask and X-Ray Mask Technology V
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
3412
Pub. Year:
1998
Page(from):
183
Page(to):
189
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819428646 [0819428647]
Language:
English
Call no.:
P63600/3412
Type:
Conference Proceedings

Similar Items:

1 Conference Proceedings Resist heating effect on 50-KeV EB mask writing

Sakurai, H., Abe, T., Itoh, M., Kumagae, A., Anze, H., Higashikawa, I.

SPIE - The International Society of Optical Engineering
7 Conference Proceedings Effectiveness of mask data process using OASIS format [5853-45]

Tabara, K., Sakurai, M., Makino, S., Itoh, T., Okada, T.

SPIE - The International Society of Optical Engineering
2 Conference Proceedings Proximity effect correction for reticle fabrication

Kamikubo,T., Abe,T., Oogi,S., Anze,H., Shimizu,M., Itoh,M., Nakasugi.T., Iijima,T., Hattori,Y.

SPIE-The International Society for Optical Engineering
8 Conference Proceedings Application of PGSD (proximity gap suction development) to 70 nm NAND mask fabrication

Sakurai, H., Shibata, T., Itoh, M., Ooishi, K., Funakoshi, H., Okamoto, Y., Oono, S., Kaneda, M., Kamei, S., Hayashi, N.

SPIE - The International Society of Optical Engineering
3 Conference Proceedings Practical approach to evaluating mask CD uniformity patterned by a variable-shaped beam

Yoshitake,S., Ogawa,Y., Sakurai,H., Itoh,M., Higashikawa,I., Nakayamada,N., Matsuki,K., Tamamushi,S.

SPIE-The International Society for Optical Engineering
9 Conference Proceedings Control of resist heating effect

Anze,H., Abe,T., Sakurai,H., Iijima,T., Hattori,Y., Nakayamada,N., Kamikubo,T.

SPIE - The International Society for Optical Engineering
4 Conference Proceedings Inspection and printability of programmed defects on reticles for 0.200- and 0.175-μm rule devices

Yamaguchi, S., Kanai, H., Komano, H., Sakurai, H., Kondo, T., Itoh, M., Mori, I., Higashikawa, I.

SPIE - The International Society of Optical Engineering
10 Conference Proceedings CD uniformity of photomasks written with high-voltage variable-shaped e beam

Nakayamada,N., Hara,S., Magoshi,T., Sakurai,H., Abe,T., Higashikawa,I.

SPIE-The International Society for Optical Engineering
5 Conference Proceedings Study of second-generation Proximity Gap Suction Development System (PGSD-II) for mask fabrication

H. Sakurai, M. Terayama, M. Sakai, M. Itoh, O. Ikenaga

Society of Photo-optical Instrumentation Engineers
11 Conference Proceedings Deep-UV attenuated phase-shift mask for quarter-micrometer photolithography

Kyoh,S., Sakurai,H., Iwamatsu,T., Higashikawa,I., Taniguchi,R., Watanabe,H., Tuchiya,T.

SPIE-The International Society for Optical Engineering
6 Conference Proceedings Evaluation of phase and transmittance error on deep-UV halftone phase-shift mask

Kyoh,S., Sakurai,H., Iwamatsu,T., Yamada,A., Higashikawa,I.

SPIE-The International Society for Optical Engineering
12 Conference Proceedings Development of EUV mask fabrication process using Ru capping blank

T. Abe, T. Adachi, S. Sasaki, H. Mohri, N. Hayashi

Society of Photo-optical Instrumentation Engineers
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12