Blank Cover Image

Mask fabrication in the USA (Invited Paper)

Author(s):
Kalk,F.D. ( DuPont Photomasks,Inc. (USA) )  
Publication title:
Photomask and X-Ray Mask Technology V
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
3412
Pub. Year:
1998
Page(from):
127
Page(to):
132
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819428646 [0819428647]
Language:
English
Call no.:
P63600/3412
Type:
Conference Proceedings

Similar Items:

1 Conference Proceedings Evaluation of a multiple-beam defect inspection platform using an integrated reference mask

Chen,J.X., Kalk,F.D., Vacca,A., Pomeroy,S., Carroll,J.

SPIE-The International Society for Optical Engineering
7 Conference Proceedings Detection and printability of random and programmed pinholes on Cr photomasks

Kalk,F.D., Vacca,A., Howard,C., Karklin,L.

SPIE-The International Society for Optical Engineering
2 Conference Proceedings Photomask production integration of KLA STARlight 300 system

Kalk,F.D., Mentzer,D., Vacca,A.

SPIE-The International Society for Optical Engineering
8 Conference Proceedings Fabrication and commercialization of scalpel masks (Invited Paper)

Novenber,A.E., Peabody,M.L., Blakey,M.I., Farrow,R.C., Kasica,R.J., Liddle,J.A., Saunders,T.E., Tennant,D.M.

SPIE-The International Society for Optical Engineering
3 Conference Proceedings Pinhole defect detection and printability prediction

Kalk,F.D., Vacca,A., Radcliff,P.

SPIE-The International Society for Optical Engineering
9 Conference Proceedings Dry etch yield enhancement by use of after-develop inspection

Kalk,F.D., Brankner,K.J., Peters,L., Vacca,A., Pomeroy,S., Emery,D.

SPIE - The International Society for Optical Engineering
4 Conference Proceedings Aerial image-based mask inspection: a development effort to detect what might impact printing image quality on wafers

Liebe, R., Haffner, H., Hemar, S., Rosenbusch, A., Chen, J.X., Kalk, F.D.

SPIE-The International Society for Optical Engineering
10 Conference Proceedings Improving reticle yields with after develop inspection(ADI)

Kalk,F.D., Brankner,K.J., Peters,L., Vacca,A., Pomeroy,S., Emery,D.

SPIE - The International Society for Optical Engineering
5 Conference Proceedings Chromium-based attenuated embedded phase-shift photomask blanks for use in 1X lithography

Schurz,D.L., Tai,E., Kalk,F.D.

SPIE-The International Society for Optical Engineering
11 Conference Proceedings Chromium-based attenuated embedded shifter preproduction

F.D. Kalk, R.H. French, H. Alpay, G.P. Hughes

Society of Photo-optical Instrumentation Engineers
6 Conference Proceedings Defect inspection of zero E-field border on i-line 9% PSM

Chen,J.X., Kalk,F.D.

SPIE-The International Society for Optical Engineering
12 Conference Proceedings Universal inspection standard for evaluation of inspection system and algorithm sensitivity and runability

Chen,J.X., Howard,C.H., Son,K., Kalk,F.D., Lee,I.-H.

SPIE - The International Society for Optical Engineering
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12