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Capping layers,cleaning method,and rapid thermal processing temperature on cobalt silicide formation

Author(s):
Saigal,D. ( Applied Materials,Inc )
Lai,G.
Yang,L.
Su,J.
Ngan,K.
Narasimhan,M.K.
Chen,F.E.
Singhal,A.
Lopes,D.
Lian,S.
Cao,W.
Tsai,K.
Lo,P.
Lee,S.K.
9 more
Publication title:
Multilevel Interconnect Technology III
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
3883
Pub. Year:
1999
Page(from):
84
Page(to):
95
Pub. info.:
Bellingham, Wash.: SPIE - The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819434807 [0819434809]
Language:
English
Call no.:
P63600/3883
Type:
Conference Proceedings

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