CD error sensitivity to "sub-killer" defects at k1 near 0.4:II

CD error sensitivity to "sub-killer" defects at k1 near 0.4:II

Author(s):

Nakagawa,K.H. ( ASML MaskToois )

Publication title:

19th Annual Symposium on Photomask Technology : 15-17 September 1999, Monterey, California

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

3873

Pub. Year:

1999

Vol.:

Part2

Page(from):

893

Page(to):

904

Pub. info.:

Bellingham, Wash.: SPIE - The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780849434686 [084943468X]

Language:

English

Call no.:

P63600/3873

Type:

Conference Proceedings

Details

TDL ID:	ZA00017632
Series ID:	PA00000029
Conf. info. (Name):	SPIE Photomask Technology : Annual Symposium on Photomask Technology
Conf. info. (Number):	1999 : 19th
Conf. info. (Venue):	Monterey, California, USA
Conf. info. (Date):	1999.09.15-1999.09.17

Similar Items:

1 Conference Proceedings Application of CPL with Interference Mapping Lithography to generate random contact reticle designs for the 65-nm node Van Den Broeke, D.J., Laidig, T.L., Chen, J.F., Wampler, K.E., Hsu, S.D., Shi, X., Socha, R.J., Dusa, M.V., Corcoran, … SPIE - The International Society of Optical Engineering	7 Conference Proceedings Design of 200-nm,170-nm,and 140-nm DUV contact sweeper high-transmission attenuating phase-shift mask through simulation:I Socha,R.J., Petersen,J.S., Chen,J.F., Laidig,T.L., Wampler,K.E., Caldwell,R.F. SPIE - The International Society for Optical Engineering
2 Conference Proceedings Manufacturing an advanced process characterization reticle incorporating halftone biasing Nakagawa,K.H., Broeke,D.Van Den, Chen,J.F., Laidig,T.L., Wampler,K.E., Caldwell,R.F. SPIE - The International Society for Optical Engineering	8 Conference Proceedings Design of 200-nm,170-nm,and 140-nm DUV contact sweeper high-transmission attenuating phase-shift mask:?.Experimental results Socha,R.J., Shi,X., Holman,K.C., Dusa,M.V., Conley,W., Petersen,J.S., Chen,J.F., Laidig,T.L., Wampler,K.E., … SPIE - The International Society for Optical Engineering
3 Conference Proceedings Practical technology path to sub-0.10-ｦﾌm process generations via enhanced optical lithography Chen,J.F., Laidig,T.L., Wampler,K.E., Caldwell,R.F., Nakagawa,K.H., Liebchen,A. SPIE - The International Society for Optical Engineering	9 Conference Proceedings Design and analysis of across-chip linewidth variation for printed features at 130 nm and below Chen,J.F., Socha,R.J., Puntambekar,K., Wampler,K.E., Caldwell,R.F., Dusa,M.V., Love,J.C., Yeric,G., Stoner,B. SPIE - The International Society for Optical Engineering
4 Conference Proceedings CD error sensitivity to “sub-killer” defects at k1 near 0.4 J. Fung Chen, Nathan A. Diachun, Kent H. Nakagawa, Robert J. Socha, Mircea V. Dusa SPIE - The International Society of Optical Engineering	10 Conference Proceedings Binary halftone chromeless PSM technology for λ/4 optical lithography Chen,J.F., Petersen,J.S., Socha,R.J., Laidig,T.L., Wampler,K.E., Nakagawa,K.H., Hughes,G.P., MacDonald,S.S., Ng,W. SPIE-The International Society for Optical Engineering
5 Conference Proceedings Complex 2D pattern lithography at λ/4 resolution using chromeless phase lithography (CPL) Van Den Broeke, D.J., Chen, J.F., Laidig, T.L., Hsu, S.D., Wampler, K.E., Socha, R.J., Petersen, J.S. SPIE-The International Society for Optical Engineering	11 Conference Proceedings Near-0.3 k1 full pitch range contact hole patterning using chromeless phase lithography (CPL) Van Den Broeke, D.J., Socha, R., Hsu, S.D., Chen, J.F., Laidig, T.L., Corcoran, N., Hollerbach, U., Wampler, K.E., Shi, … SPIE - The International Society of Optical Engineering
6 Conference Proceedings Halftone biasing OPC technology: an approach for achieving fine bias control on raster-scan systems Nakagawa, K. H., Chen, J. F., Socha, R. J., Laidig, T. L., Wampler, K. E., Van Den Broeke, D., Dusa, M. V., Caldwell, R. … SPIE - The International Society of Optical Engineering	12 Conference Proceedings Contact hole reticle optimization by using interference mapping lithography (IML) Socha, R.J., Van Den Broeke, D.J., Hsu, S.D., Chen, J.F., Laidig, T.L., Corcoran, N., Hollerbach, U., Wampler, K.E., … SPIE - The International Society of Optical Engineering

1

2

3

4

5

6

7

8

9

10

11

12