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Practical technology path to sub-0.10-ｦﾌm process generations via enhanced optical lithography

Author(s):
Chen,J.F. ( ASML MaskTools )
Laidig,T.L.
Wampler,K.E.
Caldwell,R.F.
Nakagawa,K.H.
Liebchen,A.
1 more
Publication title:
19th Annual Symposium on Photomask Technology : 15-17 September 1999, Monterey, California
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
3873
Pub. Year:
1999
Vol.:
Part2
Page(from):
995
Page(to):
1016
Pub. info.:
Bellingham, Wash.: SPIE - The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780849434686 [084943468X]
Language:
English
Call no.:
P63600/3873
Type:
Conference Proceedings

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