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Development of ZrSiO attenuated phase-shift mask for ArF excimer laser lithography

Author(s):
Fukuhara,N. ( Toppan Printing Co.Ltd. )
Haraguchi,T.
Kanayama,K.
Matsuo,T.
Takeuchi,S.
Tomiyama,K.
Saga,T.
Hattori,Y.
Ooshima,T.
Otaki,M.
5 more
Publication title:
19th Annual Symposium on Photomask Technology : 15-17 September 1999, Monterey, California
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
3873
Pub. Year:
1999
Vol.:
Part2
Page(from):
979
Page(to):
986
Pub. info.:
Bellingham, Wash.: SPIE - The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780849434686 [084943468X]
Language:
English
Call no.:
P63600/3873
Type:
Conference Proceedings

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