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Damage control during dry etching of EUV mask:I. Control of surface roughness

Author(s):
Hoshino,E. ( Association of Super-Advanced Electronics Technologies )
Ogawa,T.
Takahashi,M.
Hoko,H.
Yamanashi,H.
Hirano,N.
Okazaki,S.
2 more
Publication title:
19th Annual Symposium on Photomask Technology : 15-17 September 1999, Monterey, California
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
3873
Pub. Year:
1999
Vol.:
Part2
Page(from):
786
Page(to):
791
Pub. info.:
Bellingham, Wash.: SPIE - The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780849434686 [084943468X]
Language:
English
Call no.:
P63600/3873
Type:
Conference Proceedings

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