Comparison of binary mask defect printability analysis using virtual stepper system and aerial image microscope system

Comparison of binary mask defect printability analysis using virtual stepper system and aerial image microscope system

Author(s):

Phan,K.A. ( Advanced Micro Devices,Inc )

Publication title:

19th Annual Symposium on Photomask Technology : 15-17 September 1999, Monterey, California

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

3873

Pub. Year:

1999

Vol.:

Part2

Page(from):

681

Page(to):

694

Pub. info.:

Bellingham, Wash.: SPIE - The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780849434686 [084943468X]

Language:

English

Call no.:

P63600/3873

Type:

Conference Proceedings

Details

TDL ID:	ZA00017632
Series ID:	PA00000029
Conf. info. (Name):	SPIE Photomask Technology : Annual Symposium on Photomask Technology
Conf. info. (Number):	1999 : 19th
Conf. info. (Venue):	Monterey, California, USA
Conf. info. (Date):	1999.09.15-1999.09.17

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