Blank Cover Image

Chemically amplified positive resist for next-generation photomask fabrication

Author(s):
Katoh,K. ( Hitachi Chemical Co.Ltd. )
Kasuya,K.
Arai,T.
Sakamizu,T.
Satoh,H.
Saitoh,H.
Hoga,M.
2 more
Publication title:
19th Annual Symposium on Photomask Technology : 15-17 September 1999, Monterey, California
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
3873
Pub. Year:
1999
Vol.:
Part2
Page(from):
577
Page(to):
586
Pub. info.:
Bellingham, Wash.: SPIE - The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780849434686 [084943468X]
Language:
English
Call no.:
P63600/3873
Type:
Conference Proceedings

Similar Items:

1 Conference Proceedings Improvement of the resolution and accuracy of chemical-amplification positive resist for 0.13-ｦﾌm reticle fabrication

Arai,T., Sakamizu,T., Kasuya,K., Katoh,K., Soga,T., Saitoh,H., Shiraishi,H., Hoga,M.

SPIE - The International Society for Optical Engineering
7 Conference Proceedings Application of chemically amplified resists to photomask fabrication

M. Arai, H. Inomata, T. Nishimura, M. Kurihara, N. Hayashi

Society of Photo-optical Instrumentation Engineers
2 Conference Proceedings Improvement of post-exposure delay stability of chemically amplified positive resist

Katoh, K., Kasuya, K., Hashimoto, M., Arai, T., Sakamizu, T.

SPIE - The International Society of Optical Engineering
8 Conference Proceedings Development methods for chemical amplification resist

Saitoh,H., Soga,T., Kubo,S., Sanki,S., Hoga,M.

SPIE-The International Society for Optical Engineering
3 Conference Proceedings Chemical-amplification posotive-resist design for 0.18-ｦﾌm reticle fabricaton using the 50-kV HL-800M electron-beam system

Arai,T., Sakamizu,Y., Soga,T., Satoh,H., Katoh,K., Shiraishi,H., Hoga,M.

SPIE-The International Society for Optical Engineering
9 Conference Proceedings Improvement of CD accuracy for next-generation reticles using HL-800M and CA resists

Satoh,H., Sohda,Y., Saitoh,H., Hoga,M., Asai,S., Kawasaki,K., Mizuno,K.

SPIE - The International Society for Optical Engineering
4 Conference Proceedings Acid-breakable-resin-based chemical amplification positive resist for 0.1-μm-rule reticle fabrication: design and lithographic performance

Migitaka,S., Arai,T., Sakamizu,T., Kasuya,K., Hashimoto,M., Shiraishi,H.

SPIE-The International Society for Optical Engineering
10 Conference Proceedings Acid diffusion control in chemical amplification positive resists by exchange reaction of conjugate bases

Sakamizu,T., Arai,T., Yamaguchi,H., Shiraishi,H.

SPIE-The International Society for Optical Engineering
5 Conference Proceedings Performance of a chemically amplified positive resist for next-generation photomask fabrication

Kurihara,M., Segawa,T., Okuno,D., Hayashi,N., Sano,H.

SPIE-The International Society for Optical Engineering
11 Conference Proceedings Deblocking reaction of chemically amplified ArF positive resists

Yamana,M., Itani,T., Yoshino,H., Hashimoto,S., Tanabe,H., Kasama,K.

SPIE-The International Society for Optical Engineering
6 Conference Proceedings Performance of positive-tone chemically amplified resists for next-generation photomask fabrication

Segawa,T., Kurihara,M., Sasaki,S., Inomata,H., Hayashi,N., Sano,H.

SPIE-The International Society for Optical Engineering
12 Conference Proceedings Deblocking reaction of chemically amplified positive DUV resists

Yamana,M., Itani,T., Yoshino,H., Hashimoto,S., Samoto,N., Kasama,K.

SPIE-The International Society for Optical Engineering
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12