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High-resolution thickness measurements and evaluation of a photomask blank

Author(s):
Hirano,T. ( Toppan Printing Co.Ltd. )
Matsuo,R.
Tomiyama,K.
Yazawa,I.
Wada,H.
Otaki,M.
Omote,K.
2 more
Publication title:
19th Annual Symposium on Photomask Technology : 15-17 September 1999, Monterey, California
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
3873
Pub. Year:
1999
Vol.:
Part2
Page(from):
562
Page(to):
572
Pub. info.:
Bellingham, Wash.: SPIE - The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780849434686 [084943468X]
Language:
English
Call no.:
P63600/3873
Type:
Conference Proceedings

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