Puddle developers for ZEP 7000
- Author(s):
- Publication title:
- 19th Annual Symposium on Photomask Technology : 15-17 September 1999, Monterey, California
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 3873
- Pub. Year:
- 1999
- Vol.:
- Part2
- Page(from):
- 554
- Page(to):
- 561
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780849434686 [084943468X]
- Language:
- English
- Call no.:
- P63600/3873
- Type:
- Conference Proceedings
Similar Items:
SPIE - The International Society for Optical Engineering |
7
Conference Proceedings
Dry etching technology of Cr films to produce fine-pattern reticles under 720 nm with ZEP-7000
SPIE - The International Society for Optical Engineering |
2
Conference Proceedings
Elongation effect of a protecting layer for film life of chemically amplified-type e-beam resist
SPIE-The International Society for Optical Engineering |
8
Conference Proceedings
Impact of the loading effect on CD control in plasma etching of Cr photomasks using ZEP 7000 resist
SPIE - The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
9
Conference Proceedings
Plasma etch of AZ5206/Cr and ZEP7000/Cr for 0.18- to 0.25-ヲフm-generation advanced mask fabrication
SPIE-The International Society for Optical Engineering |
Materials Research Society |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society for Optical Engineering |
11
Conference Proceedings
Improving CDs on a MEBES system by improving the ZEP 7000 development and dry etch process
SPIE - The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |
12
Conference Proceedings
Comparison of EBR-900 M1 and ZEP 7000 with plasma-etch processing for MEBES 4500S
SPIE-The International Society for Optical Engineering |