Blank Cover Image

Comparison of at-wavelength inspection,printability,and simulation of nanometer-scale substrate defects in extreme ultraviolet lithography(EUVL)

Author(s):
Cardinale,G.F. ( Sandia National Labs. )
Goldsmith,J.E.M.
Ray-Chaudhuri,A.K.
Fisher,A.
Hector,S.D.
Mangat,P.J.S.
Masnyj,Z.S.
Mancini,D.P.
Wilkinson,B.
Bokor,J.
Jeong,S.
Burkhart,S.C.
Cerjan,C.J.
Walton,C.C.
Yan,P.
Zhang,C.
11 more
Publication title:
19th Annual Symposium on Photomask Technology : 15-17 September 1999, Monterey, California
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
3873
Pub. Year:
1999
Vol.:
Part1
Page(from):
429
Page(to):
439
Pub. info.:
Bellingham, Wash.: SPIE - The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780849434686 [084943468X]
Language:
English
Call no.:
P63600/3873
Type:
Conference Proceedings

Similar Items:

1 Conference Proceedings Use of programmed multilayer defects in validating a defect compensation strategy for EUV Lithography

Ray-Chaudhuri,A.K., Cardinale,G.F., Fisher,A., Mangat,P.J.S., Liang,S., Sweeney,D.W.

SPIE - The International Society for Optical Engineering
7 Conference Proceedings Evaluation of Shipley XP2040D positive chemically amplified resist for SCALPEL mask fabrication

Lu,B., Masnyj,Z.S., Mangat,P.J.S., Nordquist,K.J., Ainley,E., Resnick,D.J.

SPIE-The International Society for Optical Engineering
2 Conference Proceedings EUVL masks: paving the path for commercialization

Mangat,P.J.S., Hector,S.D.

SPIE-The International Society for Optical Engineering
8 Conference Proceedings Critical dimension and image placement issues for step and flash imprint lithography templates

Nordquist, K.J., Mancini, D.P., Dauksher, W.J., Ainley, E.S., Gehoski, K.A., Resnick, D.J., Masnyj, Z.S., Mangat, P.J.S.

SPIE-The International Society for Optical Engineering
3 Conference Proceedings Low-defect reflective mask blanks for extreme ultraviolet lithography

Burkhart,S.C., Cerjan,C.J., Kearney,P.A., Mirkarimi,P.B., Walton,C.C., Ray-Chaudhuri,A.K.

SPIE - The International Society for Optical Engineering
9 Conference Proceedings Infinitely selective repair buffer for EUVL reticles

Wasson,J.R., Smith,K.H., Mangat,P.J.S., Hector,S.D.

SPIE-The International Society for Optical Engineering
4 Conference Proceedings Mask technology for EUV lithography

Bujak,M., Burkhart,S.C., Cerjan,C.J., Kearney,P.A., Moore,C.E., Prisbrey,S., Sweeney,D.W., Tong,W.M., Vernon,S.P., …

SPIE - The International Society for Optical Engineering
10 Conference Proceedings Extreme ultraviolet lithography:reflective mask technology

Walton,C.C., Kearney,P.A., Mirkarimi,P.B., Bowers,J.M., Cerjan,C.J., Warrick,A.L., Wilhelmsen,K.C., Fought,E.R., …

SPIE - The International Society for Optical Engineering
5 Conference Proceedings Defect printability and inspection of EUVL mask

Lu, B., Wasson, J. R., Mangat, P. J. S., Cobb, J. L., Hector, S. D., Pettibone, D. W., O'Connell, D.

SPIE - The International Society of Optical Engineering
11 Conference Proceedings Photoresist film thickness for extreme ultraviolet lithography

Dentinger,P.M., Cardinale,G.F., Henderson,C.C., Fisher,A., Ray-Chaudhuri,A.K.

SPIE - The International Society for Optical Engineering
6 Conference Proceedings Substrate defect smoothing of EUVL mask blanks using TaSiN films

Wasson,J.R., Hopson,T., Mangat,P.J.S., Hector,S.D.

SPIE-The International Society for Optical Engineering
12 Conference Proceedings Masks for extreme ultraviolet lithography

Vernon,S.P., Kearney,P.A., Tong,W.M., Prisbrey,S., Larson,C., Moore,C.E., Weber,F.J., Cardinale,G.F., Yan,P., …

SPIE - The International Society for Optical Engineering
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12