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Realization of practical attenuated phase-shift mask with high-transmission KrF excimer laser exposure

Author(s):
Toyama,N. ( Dai Nippon Printing Co.Ltd. )
Miyashita,H.
Morikawa,Y.
Fujita,H.
Iwase,K.
Mohri,H.
Hayashi,N.
Sano,H.
3 more
Publication title:
19th Annual Symposium on Photomask Technology : 15-17 September 1999, Monterey, California
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
3873
Pub. Year:
1999
Vol.:
Part1
Page(from):
350
Page(to):
358
Pub. info.:
Bellingham, Wash.: SPIE - The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780849434686 [084943468X]
Language:
English
Call no.:
P63600/3873
Type:
Conference Proceedings

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