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High-resolution ultraviolet defect inspection of DAP(darkfield alternate phase)reticles

Author(s):
Liebmann,L.W. ( IBM Microelectronics Div. )
Mansfield,S.M.
Wong,A.K.
Smolinski,J.G.
Peng,S.
Kimmel,K.R.
Rudzinski,M.W.
Wiley,J.N.
Zurbrick,L.S.
4 more
Publication title:
19th Annual Symposium on Photomask Technology : 15-17 September 1999, Monterey, California
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
3873
Pub. Year:
1999
Vol.:
Part1
Page(from):
148
Page(to):
161
Pub. info.:
Bellingham, Wash.: SPIE - The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780849434686 [084943468X]
Language:
English
Call no.:
P63600/3873
Type:
Conference Proceedings

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