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Gate CD control for full chip using total-process-proximity-based correction method

Author(s):
Nam,B.H. ( Hyundai Electronics Industries Co.,Ltd. )
Park,J.O.
Lee,D.J.
Cheong,J.H.
Hwang,Y.J.
Song,Y.J.
1 more
Publication title:
Photomask and Next-Generation Lithography Mask Technology VII
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4066
Pub. Year:
2000
Page(from):
716
Page(to):
724
Pub. info.:
Bellingham, Wash.: SPIE - The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819437020 [0819437026]
Language:
English
Call no.:
P63600/4066
Type:
Conference Proceedings

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