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Elements of an advanced pattern generator for 130- to 100-nm maskmaking

Author(s):
Chakarina,V. ( Etec System )
Sauer,C.A.
Shamoun,B.
Chiles,F.
Trost,D.
Zywno,M.
Hofmann,U.
Teizel,R.
Prior,R.
III,F.Raymond
Ghanbari,A.
Abboud,F.E.
7 more
Publication title:
Photomask and Next-Generation Lithography Mask Technology VII
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4066
Pub. Year:
2000
Page(from):
580
Page(to):
593
Pub. info.:
Bellingham, Wash.: SPIE - The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819437020 [0819437026]
Language:
English
Call no.:
P63600/4066
Type:
Conference Proceedings

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