Current Status of 157-nm mask technology development
- Author(s):
Dao,G. ( Intel Corp. ) Kuse,R. Orvek,K.J. Panning,E.M. Remling,R. Zheng,J.F. Tsubasaki,M. Lo,F.-C. - Publication title:
- Photomask and Next-Generation Lithography Mask Technology VII
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 4066
- Pub. Year:
- 2000
- Page(from):
- 552
- Page(to):
- 563
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819437020 [0819437026]
- Language:
- English
- Call no.:
- P63600/4066
- Type:
- Conference Proceedings
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