Impact of pattern proximity correction on die-to-database mask inspection
- Author(s):
Rosenbusch,A. ( Sigma-C,Inc. ) Bailey,V. Eran,Y. Falah,F. Hamar,S. Holmes,H.J. Hound,A.C. Kirsch,H. McArthur,A. - Publication title:
- Photomask and Next-Generation Lithography Mask Technology VII
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 4066
- Pub. Year:
- 2000
- Page(from):
- 479
- Page(to):
- 486
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819437020 [0819437026]
- Language:
- English
- Call no.:
- P63600/4066
- Type:
- Conference Proceedings
Similar Items:
SPIE - The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |
3
Conference Proceedings
Halftone PSM inspection sensitivity of OPC line/space pattern for 150-nm generation
SPIE - The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
10
Conference Proceedings
Aerial-image-based off-focus inspection: lithography process window analysis during mask inspection
SPIE - The International Society of Optical Engineering |
SPIE - The International Society for Optical Engineering |
11
Conference Proceedings
Aerial image-based mask inspection: a development effort to detect what might impact printing image quality on wafers
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
12
Conference Proceedings
On the way to 1 Gb: demonstration of e-beam proximity effect correction for mask making
SPIE-The International Society for Optical Engineering |