Development of photomask process with precise CD control,and an approach for DFM(defect-free manufacturing)using a cluster tool
- Author(s):
Sasaki,S. ( Dai Nippon Printing Co.,Ltd. ) Yokoyama,T. Kurihara,M. Miyashita,H. Hayashi,N. Sano,H. - Publication title:
- Photomask and Next-Generation Lithography Mask Technology VII
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 4066
- Pub. Year:
- 2000
- Page(from):
- 305
- Page(to):
- 314
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819437020 [0819437026]
- Language:
- English
- Call no.:
- P63600/4066
- Type:
- Conference Proceedings
Similar Items:
Society of Photo-optical Instrumentation Engineers |
SPIE-The International Society for Optical Engineering |
2
Conference Proceedings
Performance of positive-tone chemically amplified resists for next-generation photomask fabrication
SPIE-The International Society for Optical Engineering |
8
Conference Proceedings
EBR900 processes in e-beam and laser beam lithographies for photomask fabrication
Society of Photo-optical Instrumentation Engineers |
3
Conference Proceedings
Development of focused-ion-beam repair for quartz defects on alternating phase-shift masks
SPIE-The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |
4
Conference Proceedings
CD performance of CA-resits with dynamically controlled multizone bake system
SPIE-The International Society for Optical Engineering |
10
Conference Proceedings
Influence of the baking process for chemically amplified resist on CD performance
SPIE-The International Society for Optical Engineering |
5
Conference Proceedings
Performance of a chemically amplified positive resist for next-generation photomask fabrication
SPIE-The International Society for Optical Engineering |
11
Conference Proceedings
In-field CD uniformity control by altering transmission distribution of the photomask using ultra fast pulsed laser technology [6283-29]
SPIE - The International Society of Optical Engineering |
6
Conference Proceedings
Development of advanced process for halftone phase-shift mask fabrication with electron-beam exposure systems
SPIE-The International Society for Optical Engineering |
12
Conference Proceedings
Methodology of adhesive energy for photomask fabrication using scanning probe microscopy
SPIE - The International Society of Optical Engineering |