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Lithography performance of contact holes:I.Optimization of Pattern fidelity using MPG and MPG-II

Author(s):
Weaver,S. ( Etec Systems Inc. )
Lu,M.
Chabala,J.M.
Ton,D.
Sauer,C.A.
MAck,C.A.
1 more
Publication title:
Photomask and Next-Generation Lithography Mask Technology VII
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4066
Pub. Year:
2000
Page(from):
160
Page(to):
171
Pub. info.:
Bellingham, Wash.: SPIE - The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819437020 [0819437026]
Language:
English
Call no.:
P63600/4066
Type:
Conference Proceedings

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