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Extreme-UV lithography:a candidate for next-generation lithography

Author(s):
Braat,J.J.M. ( Delft Univ.of Technology )  
Publication title:
Photonics, devices, and systems : proceedings from Photonics Prague '99 21-23 June 1999, Prague, Czech Republic
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4016
Pub. Year:
2000
Page(from):
2
Page(to):
7
Pub. info.:
Bellingham, Wash.: SPIE - The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819436412 [0819436410]
Language:
English
Call no.:
P63600/4016
Type:
Conference Proceedings

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