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REACTIVE-ION-ETCHING OF 100nm LINEWIDTH TUNGSTEN FEATURES USING SF6:H2 AND A Cr-LIFTOFF MASK

Author(s):
Shirey, Loretta M.
Foster, Kelly W.
Chu, William
Kosakowski, John
Rhee, Kee Woo
Eddy, Charles., Jr.
Park, Doewon
Issacson, I. Peter
McCarthy, Daniel
Marrian, Christie R. K.
Peckerar, Martin C.
Dobisz, Elizabeth A.
7 more
Publication title:
Diagnostic techniques for semiconductor materials processing : Symposium held November 29-December 2, 1993, Boston, Massachusetts, U.S.A.
Title of ser.:
Materials Research Society symposium proceedings
Ser. no.:
324
Pub. Year:
1994
Page(from):
487
Pub. info.:
Pittsburgh: MRS - Materials Research Society
ISSN:
02729172
ISBN:
9781558992238 [1558992235]
Language:
English
Call no.:
M23500/324
Type:
Conference Proceedings

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