THE EFFECT OF POLYSILICON DEPOSITION AND DOPING PROCESSES ON DOUBLE-POLY CAPACITORS-ELECTRICAL AND AFM EVALUATION
- Author(s):
- Publication title:
- Diagnostic techniques for semiconductor materials processing : Symposium held November 29-December 2, 1993, Boston, Massachusetts, U.S.A.
- Title of ser.:
- Materials Research Society symposium proceedings
- Ser. no.:
- 324
- Pub. Year:
- 1994
- Page(from):
- 397
- Pub. info.:
- Pittsburgh: MRS - Materials Research Society
- ISSN:
- 02729172
- ISBN:
- 9781558992238 [1558992235]
- Language:
- English
- Call no.:
- M23500/324
- Type:
- Conference Proceedings
Similar Items:
MRS - Materials Research Society |
Electrochemical Society |
MRS - Materials Research Society |
Society of Photo-optical Instrumentation Engineers |
3
Conference Proceedings
The Quality of Thin Silicon Films Determined by an Atomic Force Microscope (AFM)
Electrochemical Society |
9
Conference Proceedings
MICROSTRUCTURE AND INTEGRITY OF THIN SILICON FILMS ON SiO2 AFTER IMMERSION IN 10:1 BUFFERED HF
Materials Research Society |
Electrochemical Society |
10
Conference Proceedings
THE EFFECT OF POLYSILICON DOPING (USING ION IMPLANTATION OR PBr3 DIFFUSION OR INSITU DOPING) ON TiSi2 FORMATION
Materials Research Society |
5
Conference Proceedings
Low-Temperature Remote-Plasma-Assisted Jet Vapor Deposition of Silicon Nitride
MRS - Materials Research Society |
SPIE - The International Society for Optical Engineering |
Electrochemical Society |
Materials Research Society |