Si1-xGex/Si Multiple Quantum Well Wires Fabricated Using Selective Etching
- Author(s):
Yi, Shi Feng, Wang Jianlin, Liu Rong, Zhang Shulin, Gu Shunming, Zhu Lique, Hu Youdou, Zheng - Publication title:
- Strained layer epitaxy - materials processing and device applications : symposium held April 17-19, 1995, San Francisco, California, U.S.A.
- Title of ser.:
- Materials Research Society symposium proceedings
- Ser. no.:
- 379
- Pub. Year:
- 1995
- Page(from):
- 91
- Pub. info.:
- Pittsburgh, PA: MRS - Materials Research Society
- ISSN:
- 02729172
- ISBN:
- 9781558992825 [1558992820]
- Language:
- English
- Call no.:
- M23500/379
- Type:
- Conference Proceedings
Similar Items:
1
Conference Proceedings
Effects of Lateral Limited Area and Substrate Compliance on Strain Distribution and Critical Thickness of SiGe Film on Si Mesa Substrates
MRS - Materials Research Society |
MRS - Materials Research Society |
MRS - Materials Research Society |
8
Conference Proceedings
Characterization of Metal/Si1-xGex/Si Diodes Fabricated by Cryogenic Processing
MRS - Materials Research Society |
Materials Research Society |
MRS - Materials Research Society |
Materials Research Society |
10
Academic Journal
Low Head Turbine on-Cam Character and Operating Condition Optimizing Application
PublishScieSet |
MRS - Materials Research Society |
SPIE - The International Society for Optical Engineering |
6
Conference Proceedings
In Situ Phosphorus Doping of Si and Si1-xGex Epitaxial Layers by RTP/VLP-CVD
Trans Tech Publications |
12
Conference Proceedings
Alumina Nano-Wires and Nano-Belts Fabricated by an Effective Chemical Etching of PAA Template
Trans Tech Publications |