Blank Cover Image

Aluminum Wiring Reliability of Fluorinated Amorphous Carbon Interlayer

Author(s):
Iguchi, M.
Matsubara, Y.
Ito, S.
Endo, K.
Koyanagi, K.
Kishimoto, K.
Gomi, H.
Tatsumi, T.
Horiuchi, T.
4 more
Publication title:
Low-dielectric constant materials IV : symposium held April 14-16, 1998, San Francisco, California, U.S.A.
Title of ser.:
Materials Research Society symposium proceedings
Ser. no.:
511
Pub. Year:
1998
Page(from):
341
Pub. info.:
Warrendale, Pa.: MRS - Materials Research Society
ISSN:
02729172
ISBN:
9781558994171 [1558994173]
Language:
English
Call no.:
M23500/511
Type:
Conference Proceedings

Similar Items:

1 Conference Proceedings Copper Damascene Using Low-Dielectric Constant Fluorinated Amorphous Carbon Interlayer

Matsubara, Y., Endo, K., Iguchi, M., Ito, N., Aoyama, K., Tatsumi, T., Horiuchi, T.

MRS - Materials Research Society
7 Conference Proceedings Current Status Of Copper Multilevel Interconnects*

Ueno, K., Iguchi, M., Yokoyama, T., Oda, N., Miyamoto, H., Matsubara, Y., Horiuchi, T., Saito, S.

Electrochemical Society
2 Conference Proceedings Fluorinated Amorphous Carbon Thin Films Grown From C4F8 for Multilevel Interconnections of Integrated Circuits

Endo, Kazuhiko, Tatsumi, Toru, Matsubara, Yoshihisa, Horiuchi, Tadahiko

MRS - Materials Research Society
8 Conference Proceedings Preparation and Properties of Fluorinated Amorphous Carbon Thin Films by Plasma Enhanced Chemical Vapor Deposition

Endo, Kazuhiko, Tatsumi, Toru

MRS - Materials Research Society
3 Conference Proceedings Adhesion of a-C:F During Oxygen Plasma Annealing

Matsubara, Y., Endo, K., Tatsumi, T., Horiuchi, T.

MRS - Materials Research Society
9 Conference Proceedings Ti Salicide Technology Using Nitrogen Diffusion from TiN CAP by RTA in an Argon Ambient

Ishigami, T., Matsubara, Y., Iguchi, M., Horiuchi, T.

MRS - Materials Research Society
4 Conference Proceedings Integration Issues for Low-Dielectric Constant Materials in Each Generation of ULSIs

Gomi, H., Kishimoto, K., Usami, T., Koyanagi, K-I., Yokoyama, T., Oda, N., Matsubara, Y.

MRS - Materials Research Society
10 Conference Proceedings Thin TiN capped Ti-salicide technology for 0.25 μm CMOS/SIMOX

Matsubara, Y., Ohnishi, H., Ishigami, T., Iguchi, M., Nakamura, H., Horiuchi, T.

Electrochemical Society
5 Conference Proceedings Integration Issues for Low-Dielectric Constant Materials in Each Generation of ULSIs

Gomi, H., Kishimoto, K., Koyanagi, K-I., Matsubara, Y., Oda, N., Usami, T., Yokoyama, T.

Materials Research Society
11 Conference Proceedings Chemical and Thermal Stability of Fluorinated Amorphous Carbon Films for Interlayer Dielectric Applications

Chang, J. P., Krautter, H. W., Opila, R. L., Pal, C. S., Zhu, W.

Materials Research Society
6 Conference Proceedings Time-Dependent Reliability of the Interface Between A-C:F and Inorganic Dielectrics

Endo, Kazuhiko, Shinoda, Keisuke, Tatsumi, Toru, Matsubara, Yoshihisa, Iguchi, Manabu, Horiuchi, Tadahiko

MRS - Materials Research Society
12 Conference Proceedings Reliability scaling in deep submicron MOSFETs

Horiuchi,T., Ito,H., Kimizuka,N.

SPIE-The International Society for Optical Engineering
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12