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Low-Dielectric Constant SiO(F,C) Films for ULSI Interconnections Prepared by CF4 Plasma Ion Implantation

Author(s):
Publication title:
Low-dielectric constant materials IV : symposium held April 14-16, 1998, San Francisco, California, U.S.A.
Title of ser.:
Materials Research Society symposium proceedings
Ser. no.:
511
Pub. Year:
1998
Page(from):
63
Pub. info.:
Warrendale, Pa.: MRS - Materials Research Society
ISSN:
02729172
ISBN:
9781558994171 [1558994173]
Language:
English
Call no.:
M23500/511
Type:
Conference Proceedings

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