Profile Simulation of Reactive Ion Etching for Silicon Tip-on-Post and Bottleneck Structures in FED Applications
- Author(s):
- Publication title:
- Flat panel display materials III : symposium held March 31-April 3, 1997, San Francisco, California, U.S.A.
- Title of ser.:
- Materials Research Society symposium proceedings
- Ser. no.:
- 471
- Pub. Year:
- 1997
- Page(from):
- 241
- Pub. info.:
- Pittsburgh, Pa.: MRS - Materials Research Society
- ISSN:
- 02729172
- ISBN:
- 9781558993754 [1558993754]
- Language:
- English
- Call no.:
- M23500/471
- Type:
- Conference Proceedings
Similar Items:
MRS - Materials Research Society |
Materials Research Society |
Electrochemical Society |
8
Conference Proceedings
Chlorine-Based Reactive Ion Etching Process to Pattern Platinum for MEMS Applications
Materials Research Society |
3
Conference Proceedings
Fabrication and Characterization of Color Phosphors Prepared Electrophoretically for 4-Inch Full-Color FED Application
MRS - Materials Research Society |
Materials Research Society |
Materials Research Society |
SPIE - The International Society of Optical Engineering |
5
Conference Proceedings
ASSESSMENT OF SURFACE DAMAGE OF GALLIUM ARSENIDE DUE TO REACTIVE ION ETCHING
Materials Research Society |
SPIE-The International Society for Optical Engineering |
Materials Research Society |
12
Conference Proceedings
Silver Patterning by Reactive Ion Beam Etching for Microelectronics Application
Materials Research Society |