Silicon (Oxy)Nitride Thin Films Deposited by LPCVD from SiCl2H2-NH3-N2O Mixtures of Variable Composition

Silicon (Oxy)Nitride Thin Films Deposited by LPCVD from SiCl2H2-NH3-N2O Mixtures of Variable Composition

Author(s):

Publication title:

Optoelectronic materials : ordering, composition modulation, and self-assembled structures : symposium held November 28-30, 1995, Boston, Massachusetts, U.S. .

Title of ser.:

Materials Research Society symposium proceedings

Ser. no.:

417

Pub. Year:

1996

Page(from):

187

Pub. info.:

Pittsburgh, Pennsylvania.: MRS - Materials Research Society

ISSN:

02729172

ISBN:

9781558993204 [1558993207]

Language:

English

Call no.:

M23500/417

Type:

Conference Proceedings

Details

TDL ID:	ZA00017520
Series ID:	PA00000011
Conf. info. (Name):	Symposium on optoelectronic materials
Conf. info. (Number):	1995
Conf. info. (Venue):	Boston, MA, USA
Conf. info. (Date):	1995.11.28-1995.11.30

Similar Items:

1 Conference Proceedings Optical Properties of Low Pressure Chemically Vapor Deposited Silicon Oxynitride Films From SiCl2H2-NH3-N2O Mixtures Davazoglou, D. Electrochemical Society	7 Conference Proceedings COMPOSITION AND PROPERTIES OF PECVD SILICON NITRIDE FILMS DEPOSITED FROM SiH4, N2, He GASES Souk, J.H., Parsons, G.N., Batey, J. Materials Research Society
2 Conference Proceedings Thermochemistry and Composition of LPCVD Silicon Oxide Films Grown from NH3TEOS Mixtures Vahlas, C., Davazoglou, D., Vamvacas, V.E., de Parseval, P. Electrochemical Society	8 Conference Proceedings The Effect of H2 Dilution on Thin Film SiN Deposited by Hot Wire CVD Using SiH4 and NH3 Gas Mixtures Dillon, A.C., Gedvillas, L., Williamson, D.L., Thiesen, J., Perkins, J.D., Mahan, A.H. Materials Research Society
3 Conference Proceedings Polycrystalline Silicon Thin Film Transistors With Gate Oxides Deposited by LPCVD Using Tetraethylorthosilicate (TEOS) Kouvatsos, D.N., Vamvakas, V.E., Davazoglou, D. Electrochemical Society	9 Conference Proceedings Characteristics of Silicon Oxy-Nitride Thin Films Deposited by Electron Cyclotron Resonance Plasma Enhanced Chemical Vapor Deposition Valade, L., deCaro, D., Casellas, H., Basso-Bert, M., Faulmann, C., Legros, I-P., Gassoux, P., Aries, L. Electrochemical Society
4 Conference Proceedings Processing of Silicon Oxides Thin Films by Thermal LPCVD Starting from TEOS Mixtures Vamvakas, Vassilis Em., Davazoglou, Dimitris, Vahlas, Constantin MRS - Materials Research Society	10 Conference Proceedings Fluorinated Silicon Nitride Film Deposited at Low Temperatures from SiH4-SiF4-NH3 Park, Y-B., Rhee, S., Choi, J-H., Kim, C-W., Suok, J. H. MRS - Materials Research Society
5 Conference Proceedings Arrangement of Silicon and Oxygen Atoms in Low Pressure Chemically Vapor Deposited SiO2 Films by SiH4-02 and TEOS Chemistries: Comparison With Thermally Grown … Vamvakas, V., Pappa, A., Davazoglou, D. Electrochemical Society	11 Conference Proceedings Optical Properties of Undoped, Phosphorous Doped and Oxidized LPCVD Polycrystalline Silicon Films Obtained by Transmission and FTIR Measurements Davazoglou, D., Kouvatsos, D., Valamontes, E. Electrochemical Society
6 Conference Proceedings PACVD FLUORINATED SILICON NITRIDE FILMS DEPOSITED FROM SiF4/NH3 GAS MIXTURES Castro, A., Gasset, M., Gomez-Aleixandre, C., Sanchez, O., Albella, J. M. Materials Research Society	12 Conference Proceedings Direct Bonding of LPCVD Silicon Oxide Thin Films Deposited from N2O and SiH4 Watt, V.H.C., Bower, R., Chan, W., Hong, L., Moinpour, M. Electrochemical Society

1

2

3

4

5

6

7

8

9

10

11

12