Use of an Excimer Lamp for Photochemical Resistless Etching of Thermal Silicon Oxide Substrate

Use of an Excimer Lamp for Photochemical Resistless Etching of Thermal Silicon Oxide Substrate

Author(s):

Publication title:

Advanced laser processing of materials - fundamentals and applications : symposium held November 27-30, 1995, Boston, Massachusetts, U.S.A.

Title of ser.:

Materials Research Society symposium proceedings

Ser. no.:

397

Pub. Year:

1996

Page(from):

543

Pub. info.:

Pittsburgh, PA: MRS - Materials Research Society

ISSN:

02729172

ISBN:

9781558993006 [1558993002]

Language:

English

Call no.:

M23500/397

Type:

Conference Proceedings

Details

TDL ID:	ZA00017518
Series ID:	PA00000011
Conf. info. (Name):	Symposium on advanced laser processing of materials-fundamentals and applications
Conf. info. (Number):	1995
Conf. info. (Venue):	Boston, MA, USA
Conf. info. (Date):	1995.11.27-1995.11.30

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